The researchers have mastered the process technology with the norms of 1 nm
Researchers from Brookhaven national laboratory U.S. Department of energy set a world record, saying that they had mastered the process technology with the norms of only 1 nm. Experts hope to use this same technique to create and give the silicon a never-used properties. Prior to this, researchers at Brookhaven have proven the concept of using polymethylmethacrylate (organic glass), a polymer commonly used as a coating in lithography. In the role of a sensitive resist, scientists have selected silsesquioxane hydrogen.
Researchers from the Brookhaven used an electron microscope to illustrate the material even in the smaller sizes than is possible using electron-beam lithography. Typically an electron-sensitive materials were subjected to a focused electron beam, but its performance was reduced to a size that can manipulate individual atoms. The result is a new tool that can dramatically change material properties, from electrical conductivity to light transmission and interaction between them.
Before that using electron-beam lithography researchers were able to get the items no larger than 10 nm. For this purpose we used the generator slowly moving particles, which followed the special instructions of a computer program. Automated electron microscope gave the ability to create a focused electron beam on the atomic scale, allowing you to assemble individual atoms in the templates.
The team of researchers plans to use a new method to explore the limits of electronic and photonic features of the silicon.
Source: eetimes.com
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