8890 The researchers have mastered the process technology with the norms of 1 nm

The researchers have mastered the process technology with the norms of 1 nm



Researchers from Brookhaven national laboratory U.S. Department of energy set a world record, saying that they had mastered the process technology with the norms of only 1 nm. Experts hope to use this same technique to create and give the silicon a never-used properties. Prior to this, researchers at Brookhaven have proven the concept of using polymethylmethacrylate (organic glass), a polymer commonly used as a coating in lithography. In the role of a sensitive resist, scientists have selected silsesquioxane hydrogen.

Исследователи освоили техпроцесс с нормами всего 1 нм

Researchers from the Brookhaven used an electron microscope to illustrate the material even in the smaller sizes than is possible using electron-beam lithography. Typically an electron-sensitive materials were subjected to a focused electron beam, but its performance was reduced to a size that can manipulate individual atoms. The result is a new tool that can dramatically change material properties, from electrical conductivity to light transmission and interaction between them.

Before that using electron-beam lithography researchers were able to get the items no larger than 10 nm. For this purpose we used the generator slowly moving particles, which followed the special instructions of a computer program. Automated electron microscope gave the ability to create a focused electron beam on the atomic scale, allowing you to assemble individual atoms in the templates.

The team of researchers plans to use a new method to explore the limits of electronic and photonic features of the silicon.

Source: eetimes.com

See also  Bosch is preparing to launch the Automotive Cloud platform Suite
On this topic: ( from category Articles )

Leave feedback

Your email address will not be published. Required fields are marked *

*
*

Top